pulsed laser deposition

ZnO films can be deposited by a variety of deposition techniques. Magnetron sputtering, metal-organic chemical vapor deposition, pulsed laser deposition, molecular beam epitaxy and reactive e-beam evaporation are main methods for the preparation of high-quality ZnO films with strong c-axis orientation.

在已开发的众多生长技术中，磁控溅射、金属有机物气相沉积、脉冲激光沉积、分子束外延、电子束反应蒸镀法是生长出高度c轴择优取向优质薄膜的主要方法。

Cubic Boron Nitride Thin Films Prepared by Pulsed ArF Excimer Laser Deposition

ArF准分子激光立方氮化硼薄膜的制备

A CdS thin film filter is grown on quartz substrate using femtosecond pulsed laser deposition.

采用脉冲飞秒激光沉积方法，在石英衬底上制备了CdS薄膜滤波器。

The characteristic of thin film deposited by pulsed laser deposition in RF plasma

射频辅助脉冲激光沉积镀膜技术的特点

Study on Thermionic Emission Mechanism and Surface Analysis of La-Mo Film Cathode Deposited by Pulsed Laser Deposition

激光沉积镧钼薄膜阴极的表面分析和发射机理研究

Chemical stability of AIN thin films prepared by reactively pulsed laser sputtering deposition

反应式脉冲激光溅射淀积AlN薄膜化学稳定性研究

The cathode thin film of Ag 0.5V 2O 5 was fabricated using pulsed laser deposition ( PLD), and the metallic lithium anode thin film was prepared via vacuum thermal evaporation.

以脉冲激光沉积法（PLD）制备的非晶态Ag05V2O5薄膜为阴极，真空热蒸发法制备的金属锂为阳极，LiPON薄膜为电解质，成功地制备了一个新的Li/LiPON/Ag05V2O5全固态薄膜锂电池。

Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.

多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。

Synthesis and Characteristics of ZnO Thin Films by Thermal Oxidation and Pulsed Laser Deposition Techniques

热氧化法与PLD法制备ZnO薄膜及其特性

Bismuth oxide thin films have been successfully fabricated on the stainless steel substrates by using pulsed laser deposition method for the first time.

首次采用355nm脉冲激光沉积在不锈钢基片上制备了氧化铋薄膜。

The effect of laser energy density, pulsed frequency on the construction and properties of AlN thin films prepared by reactively pulsed laser sputtering deposition was discussed. And chemical stability of deposited AlN thin films has been studied in detail.

就反应式脉冲激光溅射淀积制备氮化铝（AlN）薄膜的过程，讨论了激光脉冲能量密度及脉冲频率对所制备薄膜结构性能的影响，并对薄膜的化学稳定性作了比较详细的研究。

A Study of Pulsed Laser Deposition of LiMn 2O 4 Thin Films

脉冲激光沉积LiMn2O4薄膜的研究

Preparation of Zinc Oxide Nanometer Thin Films by Vertical Target Pulsed-Laser Deposition

垂直靶向脉冲激光沉积制备氧化锌纳米薄膜

Affect of ZnO Thin Film of Pulsed Laser Deposition by Substrate Temperatures

基片温度对脉冲激光沉积ZnO薄膜性质的影响

Through analysis we review methods fabricating thin film cathode, including chemical acetate base solution technique, sol-gel method, laser ablation, plasma enhanced chemical vapor deposition, pulsed laser deposition, radio frequency magnetron sputtering deposition, and electrostatic spray deposition.

评论了近年来制备薄膜阴极的方法，包括化学酸基溶解法、溶胶-凝胶法、激光焙烧法、增强型等离子体化学气相淀积法、脉冲激光法、电子束喷射沉积法和射频磁控溅射法。

Preparation and Characterization of Tin Sulfide as a Solar Cell Material Grown by Pulsed Laser Deposition

脉冲激光沉积方法制备太阳电池材料硫化锡及其性质的研究